Oxidation and diffusion processes during annealing of TiSi(V)N films
作者： F. Fernandes , J. Morgiel , T. Polcar , A. Cavaleiro
DOI: 10.1016/J.SURFCOAT.2015.05.031
关键词: Annealing (metallurgy) 、 Complex oxide 、 Oxidation rate 、 Oxide 、 Metallurgy 、 Coating 、 Chemical engineering 、 Materials science 、 Silicon oxide 、 Dual layer 、 Ion
摘要: Abstract The degradation of self-lubricant hard coatings applied in tools for high-speed cutting or dry drilling operations occurs by a combination wear, oxidation and diffusion. aim this investigation was to study the effect V additions on diffusion processes oxide scale formation during annealing TiSiVN coatings. Relation these results with those achieved reference Ti 0.80 Si 0.15 N coating similar content is also presented. structure evolution 0.65 0.11 film assessed an in-situ hot-XRD device. A dual layer formed case protective Si–O at oxide/coating interface; however, zones defects complex developed. increased rate as result ions throughout scale, which inhibited continuous silicon layer.
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