作者: B Todorović Marković , D Vasiljević Radović , N Romčević , M Romčević , Miroslav Dramićanin
DOI: 10.1088/0022-3727/40/14/024
关键词: Nitride 、 Raman spectroscopy 、 Thin film 、 Amorphous carbon 、 Fourier transform infrared spectroscopy 、 Analytical chemistry 、 Fullerene 、 Carbon film 、 Ion 、 Chemistry
摘要: The formation of amorphous carbon nitride under bombardment fullerene thin films by single and multiple charged nitrogen ions is presented in this paper. characterization a new phase was performed Raman, Fourier transform infrared spectroscopy, low angle x-ray diffraction UV/Vis spectrophotometry. structural modification after has been examined atomic force microscopy. It found that the surface ordering changed significantly depending on charge used ions. optical band gap to be varied from 1.7 1.3 eV for bombarded N5+ 1.4 eV irradiated N+