Lithographic apparatus, programmable patterning device and lithographic method
作者： Johannes Onvlee , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Jozef Petrus Henricus Benschop , Erwin Johan Van Zwet
DOI:
关键词: Substrate (printing) 、 Lithography 、 Projection system 、 Engineering 、 Optics
摘要: In an embodiment, a lithographic apparatus is disclosed that includes modulator configured to expose exposure area of the substrate plurality beams modulated according desired pattern and projection system project onto substrate. The may be moveable with respect and/or have array lenses receive beams, area.
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