Resolution in focused electron- and ion-beam induced processing
作者： Ivo Utke , Vinzenz Friedli , Martin Purrucker , Johann Michler
DOI: 10.1116/1.2789441
关键词: Analytical chemistry 、 Electron beam physical vapor deposition 、 Chemical physics 、 Ion beam deposition 、 Silicon 、 Ion beam-assisted deposition 、 Electron beam-induced deposition 、 Ion beam 、 Adsorption 、 Surface diffusion 、 Chemistry
摘要: The key physical processes governing resolution of gas-assisted focused electron-beam and ion-beam induced deposition etching are analyzed via an adsorption rate model. authors quantify how the balance molecule depletion replenishment determines inside locally irradiated area. Scaling laws derived relating deposits to dissociation, surface diffusion, adsorption, desorption. Supporting results from experiments with a copper metalorganic precursor gas on silicon substrate presented discussed.
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E. J. Sánchez, J. T. Krug, X. S. Xie, Ion and electron beam assisted growth of nanometric SimOn structures for near-field microscopy Review of Scientific Instruments. ,vol. 73, pp. 3901- 3907 ,(2002) , 10.1063/1.1511801
C. W. Hagen, N. Silvis-Cividjian, P. Kruit, Resolution limit for Electron-Beam induced Deposition on thick substrates Scanning. ,vol. 28, pp. 204- 211 ,(2006) , 10.1002/SCA.4950280402
Satoshi Haraichi, Masanori Komuro, Broad-Pulsed Ga Ion-Beam-Assisted Etching of Si with Cl2 Japanese Journal of Applied Physics. ,vol. 32, pp. 6168- 6172 ,(1993) , 10.1143/JJAP.32.6168
Vidyut Gopal, Velimir R. Radmilovic, Chiara Daraio, Sungho Jin, Peidong Yang, Eric A. Stach, Rapid Prototyping of Site-Specific Nanocontacts by Electron and Ion Beam Assisted Direct-Write Nanolithography Nano Letters. ,vol. 4, pp. 2059- 2063 ,(2004) , 10.1021/NL0492133
J. Nilsson, J. R. I. Lee, T. V. Ratto, S. E. Létant, Localized functionalization of single nanopores Advanced Materials. ,vol. 18, pp. 427- 431 ,(2006) , 10.1002/ADMA.200501991
I. Utke, P. Hoffmann, R. Berger, L. Scandella, High-resolution magnetic Co supertips grown by a focused electron beam Applied Physics Letters. ,vol. 80, pp. 4792- 4794 ,(2002) , 10.1063/1.1489097
T. Nagata, P. Ahmet, Y. Sakuma, T. Sekiguchi, T. Chikyow, GaN nanostructure fabrication by focused-ion-beam-assisted chemical vapor deposition Applied Physics Letters. ,vol. 87, pp. 013103- ,(2005) , 10.1063/1.1968435
H‐C Petzold, PJ Heard, Ion-induced deposition for x-ray mask repair: Rate optimization using a time-dependent model Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 9, pp. 2664- 2669 ,(1991) , 10.1116/1.585668
M. Castagné, M. Benfedda, S. Lahimer, P. Falgayrettes, J.P. Fillard, Near field optical behaviour of C supertips Ultramicroscopy. ,vol. 76, pp. 187- 194 ,(1999) , 10.1016/S0304-3991(98)00075-8
TE Allen, RR Kunz, TM Mayer, Monte Carlo calculation of low-energy electron emission from surfaces Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 6, pp. 2057- 2060 ,(1988) , 10.1116/1.584111