Novel scheme for the preparation of transmission electron microscopy specimens with a focused ion beam

作者: M. H. F. Overwijk

DOI: 10.1116/1.586537

关键词: Transmission electron microscopyNanotechnologySputteringMaterials scienceResolution (electron density)Focused ion beamSubstrate (electronics)Ion beamSample preparationOptoelectronicsWafer

摘要: A novel scheme is presented for the preparation of cross‐section transmission electron microscopy (TEM) specimens, with a focused ion beam (FIB). This particularly suitable highly structured substrates, such as integrated circuits. The specimen made by cutting thin slice material from substrate sputtering FIB. position can be selected submicron resolution. subsequently removed and transported to standard TEM‐specimen holder. specimen, ready TEM inspection, prepared within 2 hs. samples are excellent quality illustrated images FIB‐made specimens an electrically programmable read‐only memory.

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