作者: R Hull , J A Floro , M Gherasimova , J F Graham , J L Gray
DOI: 10.1088/1742-6596/209/1/012003
关键词: Electron beam-induced deposition 、 Single crystal 、 Lithography 、 Fabrication 、 Materials science 、 Nanostructure 、 Nanotechnology 、 Focused ion beam 、 Self-assembly 、 Electron microscope
摘要: We employ focused ion beam patterning of single crystal Si(100) surfaces to template the assembly Ge(Si) nanostructure arrays. The evolution and final structures templated arrays are determined by combinations transmission electron, low energy electron microscope, scanning probe microscopies. It is shown how positions individual nanostructures may be controlled order 10 nm. However, achieve spacings between elements that in nm range requires careful matching characteristic lengths scales self mechanisms length external lithographic forcing functions.