Conformal 3D Nanopatterning by Block Copolymer Lithography with Vapor-Phase Deposited Neutral Adlayer
作者： Geon Gug Yang , Junhwan Choi , Seung Keun Cha , Gil Yong Lee , Hyeong Min Jin
关键词: Self-assembly 、 Dielectric 、 Thin film 、 Nanoscopic scale 、 Reduction (complexity) 、 Lithography 、 Optoelectronics 、 Transistor 、 Materials science 、 Copolymer
摘要: Block copolymer (BCP) lithography is an effective nanopatterning methodology exploiting nanoscale self-assembled periodic patterns in BCP thin films. This approach has a critical …
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