Nonlinear Plasmonics: Four-photon Near-field Photolithography using Optical Antennas
作者： Hao Jiang , Reuven Gordon
DOI: 10.1007/S11468-013-9584-0
关键词: Optoelectronics 、 Plasmon 、 Photoresist 、 Photolithography 、 Nonlinear optics 、 Order of magnitude 、 Absorption (electromagnetic radiation) 、 Nonlinear system 、 Near and far field 、 Optics 、 Materials science
摘要: Recent experiments on four-photon nonlinear exposure of photoresist near nanoplasmonic structures raise a question: What processes are responsible for the observed profile? Here, we study poly(methyl methacrylate) (PMMA) in near-field gold nanoantennas. We consider six possible and them terms developed volumes profiles photoresist. find that direct fourth harmonic generation (4HG) is dominant process. The volume from 4HG both match closely with experiments. next strongest process absorption (4PA) PMMA. strength 4PA about one order magnitude weaker than 4HG. predicted clearly deviate
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