Chemisorption of Oxygen on Ordered Tungsten Surfaces

摘要: Chemisorption of oxygen on highly ordered and relatively disordered tungsten surfaces at substrate temperatures 20° 300°K has been studied in the field‐emission microscope. Evidence is presented for chemisorption a monolayer gas with sticking coefficient unity adsorption second, initially mobile layer oxygen, also when temperature 20°K. These results are independent degree surface order over range considered. The second adsorbed not observed 300°K, use Langmuir postulate that only clean contributes to allows definition constant 0.8 300°K. Variations dipole moment per adatom crystallographic orientation reported.