Inductively coupled plasma system
作者： Hea-young Yoon , Dong-joon Ma , Chang-wook Moon , Yuri Nikolaevich Tolmachev
DOI:
关键词: Inductor 、 Plasma 、 Susceptor 、 Optoelectronics 、 Plasma reaction 、 Substrate (printing) 、 Shutter 、 Inductively coupled plasma 、 Wafer 、 Chemistry 、 Analytical chemistry
摘要: An inductively coupled plasma apparatus is provided, wherein the includes a process chamber having wafer susceptor on which substrate installed, top source installed chamber, reactor, in channel through gas flows, reactor supplies reaction products to an inductor, two ends, between and wound around opening positioned within circumferential space inductor shutter operable open close opening. Thus, uniform radial distribution of radicals emanating from can be improved.
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