The Effect of Molybdenum Substrate Oxidation on Molybdenum Splat Formation

作者: Jun Wang , Chang-Jiu Li

DOI: 10.1007/S11666-017-0664-0

关键词: OxideMaterials scienceTransition temperatureIon beamX-ray photoelectron spectroscopyMolybdenumComposite materialCarbonLayer (electronics)Substrate (electronics)

摘要: Disk splats are usually observed when the deposition temperature exceeds transition temperature, whereas thick oxide layer will reduce adhesion resulting from high temperature. In present study, single molybdenum were deposited onto polished substrates with different preheating processes to clarify effect of surface oxidation on splat formation. Three substrate samples experienced three in an argon atmosphere. Two preheated 350 and 550 °C, another sample was cooled °C after it °C. The chemistry compositions examined by XPS. cross sections prepared focus ion beam (FIB) then characterized SEM. Nearly disk-shaped small fingers periphery A perfect disk-shape at With (cooling down °C), flower-shaped exhibited a central core discrete detached some voids. results peeling off carbon tape morphology FIB sampled indicated that no effective bonding formed splat–substrate interface for ever heated due increasing content MoO3 surface.

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