作者: Vaibhav Monga , K. J. Vinoy
DOI: 10.1109/IAIM.2017.8402603
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摘要: In this paper, we investigate the effect of microstrip patch element pattern on linear array excitation required for equal sidelobes. Due to multiplication rule, weights factor differently at different angles, therefore, sidelobes will be from isotropic chebyshev case. Both broadside and scanning cases have been discussed a method obtain both has given. Since, pattern, either in E-plane or H-plane, is dependent its dimensions, changing dimensions also discussed. It shown that beamwidth(FNBW) new better than Isotropic Dolph excitation.