Microstructures and methods for manufacturing microstructures

摘要: A method is disclosed for the manufacture of microstructures and devices. The relatively easy to implement, has capability produce features having a resolution ten microns or smaller with high aspect ratio (60, 75, 100, 200, even higher). master mask, appropriately designed fabricated, used in an initial exposure step visible light, ultraviolet x-rays, electron beam, ion beam make 'transfer mask' directly on surface sample. It not necessary expensive x-ray if sample desired. There no necessity gap control during resist through transfer mask. resulting structures may, desired, have higher than that previously been produced other methods. unit separate from sample, but formed each conventional-type mask form beam. total cost determined primarily by Because can be optical producing conventional avoided. 'master individually. patterned comprises thin layer absorber radiation final exposure. For example, performed soft may such as gold. then one more exposures underlying resist. An analogous radiation-assisted chemistry, etching deposition,