作者: Liang Tong , Ling Xu , Yifan Jiang , Fei Yang , Lei Geng
DOI: 10.1016/J.JNONCRYSOL.2011.11.022
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摘要: Abstract The phase-change characteristics of silicon doped Ge 2 Sb Te 5 (Si-GST) film were investigated and compared with pure (GST) film. results in situ temperature dependence the sheet resistance demonstrate that crystalline resistivity GST increased by doping, but phase transition T c was almost unchanged. minimum on/off ratio for Si-doped is around 240, which high enough to be used device application. Both prototype memory devices can perform SET RESET cycles. threshold voltage V th while current decreased doping. Applying Kissinger method activation energy crystallization (300 nm) determined 2.30 ± 0.05 eV.