The Surface of Si(111) during Etching in NaOH Studied by FTIR Spectroscopy in the ATR Technique
作者： J. Rappich , H. J. Lewerenz , H. Gerischer
DOI: 10.1149/1.2221161
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摘要: … experiments a mechanism of the etching of silicon in NaOH solutions was recently derived … is terminated by Si-H bonds and that this structure is preserved during the etching process. 1…
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