Nanopatterning of alkyl monolayers covalently bound to Si(111) with an atomic force microscope
作者： Masato Ara , Harald Graaf , Hirokazu Tada
DOI: 10.1063/1.1467973
关键词:
摘要: Alkyl monolayers covalently bound to silicon were prepared through the reaction between 1-alkene molecules and hydrogen-terminated Si. The surfaces anodized in nanometer scale with a contact-mode atomic force microscope (AFM) by applying positive bias voltage surface respect conducting cantilever under ambient conditions. Following anodization, patterned areas selectively modified chemical etching coating different molecules. alkyl showed high resistance against protected Si from oxidation. AFM lithography of on was found be useful for nanofabrication organic/inorganic interfaces based Si–C covalent bond.
scitation.org
harvard.edu
aip.org
sci-hub.se 参考文章(22)
Hiroyuki Sugimura, Tatsuya Uchida, Noboru Kitamura, Hiroshi Masuhara, None, Scanning Tunneling Microscope Tip-Induced Anodization for Nanofabrication of Titanium The Journal of Physical Chemistry. ,vol. 98, pp. 4352- 4357 ,(1994) , 10.1021/J100067A023
Kazuhiko Matsumoto, Application of scanning tunneling microscopy nanofabrication process to single electron transistor Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 14, pp. 1331- 1335 ,(1996) , 10.1116/1.589091
J. A. Dagata, J. Schneir, H. H. Harary, C. J. Evans, M. T. Postek, J. Bennett, Modification of hydrogen-passivated silicon by a scanning tunneling microscope operating in air Applied Physics Letters. ,vol. 56, pp. 2001- 2003 ,(1990) , 10.1063/1.102999
Susan L. Brandow, Jeffrey M. Calvert, Eric S. Snow, Paul M. Campbell, Metal pattern fabrication using the local electric field of a conducting atomic force microscope probe Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 15, pp. 1455- 1459 ,(1997) , 10.1116/1.580561
Hiroyuki Sugimura, Osamu Takai, Nakagiri Nakagiri, Scanning probe lithography for electrode surface modification Journal of Electroanalytical Chemistry. ,vol. 473, pp. 230- 234 ,(1999) , 10.1016/S0022-0728(99)00062-5
Ashish Bansal, Xiuling Li, Iver Lauermann, Nathan S. Lewis, Sang I. Yi, W. H. Weinberg, Alkylation of Si Surfaces Using a Two-Step Halogenation/Grignard Route Journal of the American Chemical Society. ,vol. 118, pp. 7225- 7226 ,(1996) , 10.1021/JA960348N
Rivka Maoz, Sidney R. Cohen, Jacob Sagiv, Nanoelectrochemical Patterning of Monolayer Surfaces: Toward Spatially Defined Self-Assembly of Nanostructures Advanced Materials. ,vol. 11, pp. 55- 61 ,(1999) , 10.1002/(SICI)1521-4095(199901)11:1<55::AID-ADMA55>3.0.CO;2-8
Takeo Hattori, Yasunori Ejiri, Kenji Saito, Masatoshi Yasutake, Fabrication of nanometer‐scale structures using atomic force microscope with conducting probe Journal of Vacuum Science and Technology. ,vol. 12, pp. 2586- 2590 ,(1994) , 10.1116/1.579062
Alexander B. Sieval, Vincent Vleeming, Han Zuilhof, Ernst J. R. Sudhölter, An Improved Method for the Preparation of Organic Monolayers of 1-Alkenes on Hydrogen-Terminated Silicon Surfaces Langmuir. ,vol. 15, pp. 8288- 8291 ,(1999) , 10.1021/LA9904962
R. Boukherroub, S. Morin, F. Bensebaa, D. D. M. Wayner, New Synthetic Routes to Alkyl Monolayers on the Si(111) Surface1 Langmuir. ,vol. 15, pp. 3831- 3835 ,(1999) , 10.1021/LA9901478