Antireflection surfaces in silicon using binary optics technology
作者： M. E. Motamedi , W. H. Southwell , W. J. Gunning
DOI: 10.1364/AO.31.004371
关键词:
摘要: Binary optics processing methods were applied to a silicon substrate generate an array of small pillars in order enhance transmission. The volume fraction the was chosen simulate single homogeneous antireflection layer, and pillar height targeted be quarter-wave thickness. A mask generated, using graphics computer-aided design system; reactive-ion etching used pillars. An improvement long-wavelength infrared transmission is observed, with diffraction scattering dominating at shorter wavelengths.
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harvard.edu参考文章(9)
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