Branching self-assembling photoresist with decomposable backbone
作者： Robert P. Meagley
DOI:
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摘要: By using a branched long chained chain scission polymer as photoresist for high resolution extreme ultraviolet (EUV), e-beam or 193 nanometer lithography applications, relatively higher molecular weight with good mechanical properties may be achieved. In addition, by technology, line edge roughness and improved at the same time.
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