Block copolyesters of polysiloxanes

摘要: Solvent soluble block copolyesters consisting essentially of units having the formula: ##EQU1## WHEREIN R is an alkylene radical containing at least 3 carbon atoms; 1 alkyl and 2 alkyl, alkaryl, aralkyl or aryl radical; A arylene a integer 10; b 1; c 2; d are formed by first reacting dihalo-polydiorganosiloxane with dihydric phenol other diol subsequently resulting reaction product dicarboxylic acid halide. These polymers useful as release agents leveling find particular utility abhesive materials for waterless lithographic printing plates.