A Mathematical Model of the Fluid Mechanics and Gas‐Phase Chemistry in a Rotating Disk Chemical Vapor Deposition Reactor

摘要: We describe a mathematical model of the coupled fluid mechanics and gas-phase chemical kinetics in rotating-disk vapor deposition reactor. The analysis uses similarity transformation that reduces problem to one-dimensional boundary value problem. silicon from silane is used as an example system. present predictions rate function susceptor temperature, spin rate, carrier gas. 12 refs.