Effect of power density on the microstructure and properties of titanium diboride thin films by radio frequency magnetron sputtering method

摘要: Abstract Thermoelectric generators directly convert heat into electricity and offer a unique very promising pathway for generating power. Titanium diboride, TiB2, is an ideal candidate use as electrode material in thermoelectric systems because of its refractory characteristic excellent electrical conductivity. This study reports the effect sputtering power density on microstructural, mechanical properties TiB2 films fabricated by radio frequency magnetron sputtering. The thin were deposited at 500 °C with densities 5.1–12.7 W/cm2. As increased, X-ray diffraction analysis showed formation trend highly crystallized hexagonal (001) preferential orientation. photoelectron spectroscopy data revealed that only T–B chemical bonding states present phase. also exhibited denser microstructure larger grain size. All three factors led to lowering films' resistivity. A minimum resistivity 6.5 × 10−4 Ωcm was obtained free-electron concentration 1.2 × 1020 cm−3 carrier mobility 86.7 cm2 V−1 s−1. hardness elastic modulus found increase discharge from 19.5 26.6 GPa 165.2 196.8 GPa, respectively. demonstrated combination high melting point makes applications.