作者: Ma Yun-Gui , Yang Zheng , M Matsumoto , A Morisako , S Takei
DOI: 10.1088/1009-1963/13/11/038
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摘要: Thin films of Nd2Fe14B were fabricated on heated glass substrates by dc magnetron sputtering. Different material underlayers (Ta, Mo, or W) used to examine the underlayer influence structural and magnetic properties NdFeB films. Deposited a Ta buffer layer at 420 degrees C, 300 nm thick shown be isotropic. But when substrate temperature Ts was elevated 520 crystallites (00l) plane epitaxially grown (110) underlayer. In contrast, Mo could not induce any preferential orientation in film irrespective thickness. The W found most effective for nucleation with c-axis alignment perpendicular Ts<490 C. Ts=490 C became maximum coercivity obtained about 995 kA/m 100nm deposited 490 These variations tentatively explained terms lattice misfit between layer, combined considerations morphologies.