Metal-Germanium Contacts and Germanide Formation

作者: E. D. Marshall , C. S. Wu , C. S. Pai , D. M. Scott , S. S. Lau

DOI: 10.1557/PROC-47-161

关键词:

摘要: In this study, we survey germanide formation and characterize Schottky- barrier properties for a number of representative metals on Ge (Al, Ag, Au, Er, Ni, Pd, Pt, Ta Ti). It is found that the characteristics (sequence phase formation, kinetics, moving species) are similar to those corresponding silicides. The Schottky-barrier heights, however, all centered around 0.59 eV arida re relatively insensitive metallization.

参考文章(16)
Norman G. Einspruch, Vlsi Electronics: Microstructure Science ,(1982)
Shyam P Murarka, Silicides for VLSI applications Elsevier. ,(1983)
C. Quaresima, P. Perfetti, R. R. Daniels, G. Margaritondo, Schottky barrier formation on amorphous semiconductors: Au on Ge(111), a‐Ge, and hydrogenated a‐Ge Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 2, pp. 524- 526 ,(1984) , 10.1116/1.572612
Otto F. Sankey, Theory of Schottky barrier formation for transition metals on Si, Ge, diamond, and Six Ge1−x alloys Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 2, pp. 491- 495 ,(1984) , 10.1116/1.582901
K. T. Ho, C.‐D. Lien, U. Shreter, M‐A. Nicolet, An inert marker study for palladium silicide formation: Si moves in polycrystalline Pd2Si Journal of Applied Physics. ,vol. 57, pp. 227- 231 ,(1985) , 10.1063/1.334793
M.G. Grimaldi, L. Wieluński, M.-A. Nicolet, K.N. Tu, Germanide formation by thermal treatment of platinum films deposited on single-crystal Ge〈100〉 substrates Thin Solid Films. ,vol. 81, pp. 207- 211 ,(1981) , 10.1016/0040-6090(81)90483-1
J. M. Poate, K. N. Tu, J. W. Mayor, Archibald L. Fripp, Thin Films—Interdiffusion and Reactions Journal of The Electrochemical Society. ,vol. 126, ,(1979) , 10.1149/1.2129351
K. N. Tu, R. D. Thompson, B. Y. Tsaur, Low Schottky barrier of rare‐earth silicide onn‐Si Applied Physics Letters. ,vol. 38, pp. 626- 628 ,(1981) , 10.1063/1.92457
B. Y. Tsaur, S. S. Lau, J. W. Mayer, M.‐A. Nicolet, Sequence of phase formation in planar metal-Si reaction couples Applied Physics Letters. ,vol. 38, pp. 922- 924 ,(1981) , 10.1063/1.92183
John Bardeen, Surface States and Rectification at a Metal Semi-Conductor Contact Physical Review. ,vol. 71, pp. 717- 727 ,(1947) , 10.1103/PHYSREV.71.717