作者: Patrick Post , Nicolas Jidenko , Alfred Weber , Jean-Pascal Borra
DOI: 10.3390/NANO6050091
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摘要: The plasma-based aerosol process developed for the direct coating of particles in gases with silicon oxide a continuous chemical vapor deposition (CVD) is presented. It shown that non-thermal plasma filaments induced dielectric barrier discharge (DBD) at atmospheric pressure trigger post-DBD gas phase reactions. DBD operating conditions are first scanned to produce ozone and dinitrogen pentoxide. In selected conditions, these species react gaseous tetraethyl orthosilicate (TEOS) precursor downstream DBD. intermediates then condense on surface nanoparticles self-reactions lead homogeneous solid SiOx coatings, thickness from nanometer micrometer. This confirms interest injection organo-silicon achieve stable production actives subsequent controlled coatings. coatings spherical agglomerated metal (Pt, CuO, TiO2) achieved. sized depends reaction duration concentration. For agglomerates, can be tuned cover preferentially interparticle contact zones between primary particles, shifting sintering platinum agglomerates much higher temperatures than usual temperature. Potential applications enhanced thermal stability tunable photoactivity coated