作者: M.T. Paffett , R.G. Windham
DOI: 10.1016/0039-6028(89)90035-6
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摘要: Abstract Vapor deposition of Sn onto Pt(111) in ultrahigh vacuum (UHV) has been examined by Auger electron spectroscopy (AES), X-ray photoelectron (XPS), low energy diffraction (LEED) and ion (Ne + ) scattering (LEISS). The AES uptake plots for depositions at substrate temperatures between 140 400 K indicate a uniform layer growth up to exposure 9.1 × 10 14 atoms cm -2 . LEED data taken simultaneously the successive appearance following patterns submonolayer coverages: (√3 √3) R 30° followed c(4 2). Simple overlayer real space structures are suggested these ordered overlayers. For exposures greater than temperatures, nonlinear an increasingly diffuse pattern observed. above 450 K, Pt-Sn alloy formation is strongly from LEISS data. Annealing Sn-Pt interface 1000 K. produces (as judged LEED) surfaces. Evidence also inferred variable incidence angle Real models consistent with proposed.