METHOD FOR APPLYING POLYIMIDE RESIN

摘要: PURPOSE:To enhance the quality and productivity of a wafer, by irradiating polyimide resin applied to surface wafer with ultraviolet rays having predetermined wavelength for required time flatten resin. CONSTITUTION:For example, after 1 such as glass substrate was washed dried, ozone is blown remove org. substance on said surface. Next, 10 using roll coater system and, subsequently, irradiated 184.9-253.7 nm from above about 2 min an irradiation means 7 mercury lamp polymide 1. Thereafter, fed hot plate 9 feed belt 8 dried cured heating.