作者: R. Leon , C. Lobo , J. Zou , T. Romeo , D. J. H. Cockayne
DOI: 10.1103/PHYSREVLETT.81.2486
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摘要: Contrasting behaviors are observed in InGaAs/GaAs island formation during vapor phase epitaxy: variation of group V partial pressures gives different critical thicknesses for the onset Stranski-Krastanow transformation, surface coverages, ratios between coherent and incoherent islands, dissimilar morphologies upon annealing. The latter experiments show that small lens-shaped islands can be found equilibrium if InGaAs energies minimized, leading to conclusion AsH3 raise act as an impurity-free "morphactant."