Antireflective coating for photoresist compositions
作者： Jianhui Shan , Shuji Ding , Eleazar Gonzalez , Dana L. Durham , Dinesh N. Khanna
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摘要: The present invention relates to a novel antireflective coating solution and process for its use in photolithography. comprises polymer an organic solvent or mixture of solvents, where the unit containing dye that absorbs from about 180 nm 450 does not contain crosslinking group.
google.pl参考文章(27)
Michael Portugall, Karl H. Etzbach, Hans W. Schmidt, Helmut Ringsdorf, Polymers containing mesogenic groups and dye radicals in the side chains ,(1984)
Xie Shao, Jim D. Meador, Terry Lowell Brewer, Tony D. Flaim, Thermosetting anti-reflective coatings compositions ,(1995)
Robert A. Norwood, Ralph R. Dammel, Light-absorbing antireflective layers with improved performance due to refractive index optimization ,(1999)
Anselm C. Griffin, Side chain liquid crystalline polymers as nonlinear optical materials ,(1991)
Ralph R. Dammel, Ming Kang, Iain Mcculloch, Shuji Ding, Dana L. Durham, Ping-Hung Lu, Dinesh N. Khanna, Aqueous antireflective coatings for photoresist compositions ,(1997)
Masaaki Nakahata, Hirotoshi Fujie, Keiji Oono, Fumiyoshi Urano, Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere ,(1991)
Yoshiji Yumoto, Takayoshi Tanabe, Hiroaki Nemoto, Takao Miura, Reflection preventing film and process for forming resist pattern using the same. ,(1993)
Jean M. J. Frechet, Hiroshi Ito, Carlton G. Willson, Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone ,(1982)
Robert A. Norwood, Ralph R. Dammel, Bottom antireflective coatings through refractive index modification by anomalous dispersion ,(1997)
Reinhold Schwalm, Horst Binder, Positive and negative working radiation sensitive mixtures and production of relief patterns ,(1989)