The direct nano-patterning of ZnO using nanoimprint lithography with ZnO-sol and thermal annealing
作者： Ki-Yeon Yang , Kyung-Min Yoon , Kyung-Woo Choi , Heon Lee
DOI: 10.1016/J.MEE.2009.03.078
关键词:
摘要: Nano-patterned ZnO layer was fabricated by ZnO-sol imprinting with a polymeric mold, followed annealing. Instead of polymer based imprint resin, used as an resin. During the process, organic solvent in absorbed into mold and thus, converted to ZnO-gel. These patterns were subsequently annealed at 650^oC for 1h atmospheric ambient form patterns. X-ray diffraction (XRD) photoluminescence (PL) confirmed that ZnO-gel completely Using this method, nano-patterns, small 50nm, on Si oxidized wafer substrates. The nano-patterns characterized using scanning electron microscopy (SEM) Transmission (TEM).
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