The formation of nano-dot and nano-ring structures in colloidal monolayer lithography

摘要: Monolayers of colloidal particles formed in a self-organizing process upon drying suspension are used as lithographic masks. After deposition thin metal layer, the mask is detached from surface. The resulting surface examined with optical, scanning electron, and atomic force microscopes. In addition to well-known triangular structures, which reflect gaps hexagonal arrangement particles, we observed following additional features:  hillocks (nano-dots) found just below nano-rings around original location particles. These features may develop during detachment (hillocks) formation (rings) mask, respectively. Hillocks consequence adhesion on surface, whereas rings organic residuals suspension. We show that these can be fabricate fluorescent dye submicron size.