Interactive metal ion–silicon oxidation/reduction processes on fumed silica

作者: J. Wang , B. Mao , M. G. White , C. Burda , J. L. Gole

DOI: 10.1039/C2RA20580G

关键词:

摘要: Fumed silica is shown to represent an active oxidation/reduction site. Arresting results demonstrate that the average oxidation state of silicon, at least surface fumed silica, +1 in contrast assumed value +4, thus allowing preparation with desired reduced silicon states without post-synthesis treatment. The nature this interface demonstrated by preparing Fe/silica and Cu/silica materials unprecedented control transition metal state. Supported iron or copper catalysts were prepared contacting anhydrous iron(III) chloride, nitrate nonahydrate, hydrated copper(II) chloride fumed, amorphous (CAB-O-SIL®) dry methanol room temperature. Subsequently, solids vacuum-dried (∼10−3 Torr) temperature for two hours. These solids, particular iron-silica interface, examined X-ray photoelectron spectroscopy (XPS), Fourier transform infra-red (FTIR) spectroscopy, UV-vis diffuse reflectance (DRS), diffraction (XRD), transmission electron microscopy (TEM), colour analysis, water contact angle analysis. No discernible evidence was found indicated formation large crystallites metals. products interaction also investigated using phenanthroline complexation confirm presence Fe(II) ions. This body data showed compelling a portion ions lower while some observed be “oxidized” higher states. ratio over Fe(III) XPS deconvolution spectra matches well theoretical prediction based upon simple reaction between valent Si Fe doping deduced more likely axial position Si–O bond rather than equatorial. It remarkable these transitions ion occurred inherent simplicity technique general many reducible oxides, thus, its use preparations may provide new way controlling various elements.

参考文章(16)
S.M Prokes, W.E Carlos, Lenward Seals, Stephen Lewis, James L Gole, Formation of ferromagnetic Ni/SiO2 nanospheres Materials Letters. ,vol. 54, pp. 85- 88 ,(2002) , 10.1016/S0167-577X(01)00623-1
James L. Gole, Brian D. Shinall, Alexei V. Iretskii, Mark G. White, Ann S. Erickson, Surface oxidation states in Si/SiO2 nanostructures prepared from Si/SiO2 mixtures. Langmuir. ,vol. 20, pp. 260- 262 ,(2004) , 10.1021/LA035072T
T. Yamashita, P. Hayes, Reply to Paparazzo Journal of Electron Spectroscopy and Related Phenomena. ,vol. 154, pp. 41- 42 ,(2006) , 10.1016/J.ELSPEC.2006.10.005
Ernesto Paparazzo, On the quantitative XPS analysis of Fe2O3 and Fe1−xO oxides Journal of Electron Spectroscopy and Related Phenomena. ,vol. 154, pp. 38- 40 ,(2006) , 10.1016/J.ELSPEC.2006.09.004
Toru Yamashita, Peter Hayes, Effect of curve fitting parameters on quantitative analysis of Fe0.94O and Fe2O3 using XPS Journal of Electron Spectroscopy and Related Phenomena. ,vol. 152, pp. 6- 11 ,(2006) , 10.1016/J.ELSPEC.2006.02.002
Tsang-Hsiu Wang, James L. Gole, Mark G. White, Clifton Watkins, Shane C. Street, Zongtang Fang, David A. Dixon, The surprising oxidation state of fumed silica and the nature of water binding to silicon oxides and hydroxides Chemical Physics Letters. ,vol. 501, pp. 159- 165 ,(2011) , 10.1016/J.CPLETT.2010.11.013
M. Noorjahan, V. Durga Kumari, M. Subrahmanyam, Lipsa Panda, Immobilized Fe(III)-HY: an efficient and stable photo-Fenton catalyst ☆ Applied Catalysis B-environmental. ,vol. 57, pp. 291- 298 ,(2005) , 10.1016/J.APCATB.2004.11.006
Toru Yamashita, Peter Hayes, Analysis of XPS spectra of Fe2+ and Fe3+ ions in oxide materials Applied Surface Science. ,vol. 254, pp. 2441- 2449 ,(2008) , 10.1016/J.APSUSC.2007.09.063
A Hohl, T Wieder, P.A van Aken, T.E Weirich, G Denninger, M Vidal, S Oswald, C Deneke, J Mayer, H Fuess, An interface clusters mixture model for the structure of amorphous silicon monoxide (SiO) Journal of Non-crystalline Solids. ,vol. 320, pp. 255- 280 ,(2003) , 10.1016/S0022-3093(03)00031-0