作者: M. Zeldin , D.W. Kang , G.P. Rajendran , B. Qian , S.J. Choi
DOI: 10.1016/0048-9697(88)90188-X
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摘要: Abstract The thermal degradation of Me3SiO end-blocked polydimethylsiloxane (eb-PDMS) and polydimethylsiloxane-N-phenylsilazane (eb-PDMS-NPhSz) copolymer was studied. For both polymers, relative degree polymerization( DP / 0 ) as a function conversion (C = 1 − W/W0) data were obtained. eb-PDMS with three different molecular weights, the results consistent mechanism involving rate-determining random siloxane bond cleavage initiation step followed by rapid complete depropagation active fragments evolving volatile cyclic oligomers. Rate constants for obtained at four temperatures from plots −1 vs. time M n 6.83 × 10 4 . An Arrhenius activation energy ∼ is SiOSi scission transition state. eb-PDMS-NPhSz appears to follow same depolymerization process Although C suggest cleavage-complete mechanism, an plot suggests more complex mechanism. role impurities catalysts discussed.