Nanometric patterning of zinc by optical near‐field photochemical vapour deposition
作者： Polonski , Yamamoto , Kourogi , Fukuda , Ohtsu
DOI: 10.1046/J.1365-2818.1999.00497.X
关键词:
摘要: A new technique, optical near-field photochemical vapour deposition (NFO-PCVD) enables maskless production of nanometric structures with controllable size, chemical composition and morphology. By placing a microscope inside the reaction chamber for we have deposited nanoscale metal patterns. We demonstrate first time, successfully in region, lines metallic zinc observed stripe width 20 nm.
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