Plastic deformation of single crystals of TiSi2 with the C54 structure
作者： H Inui , M Moriwaki , N Okamoto , M Yamaguchi
DOI: 10.1016/S1359-6454(02)00533-5
关键词:
摘要: Abstract The deformation behavior of single crystals TiSi 2 with the orthorhombic C54 structure has been investigated as a function crystal orientation in temperature range from room to 1400 °C compression. Plastic flow is possible only when slip along on (001) operative and no other systems are observed whole investigated. While plastic above 300 for as-grown crystals, onset lowered considerably down prestrained at 1300 then re-deformed low temperatures. critical resolved shear stress (CRSS) decreases increasing temperature, exhibiting moderate peak (or plateau) 800 1100 °C. mechanism discussed comparison those reported transition-metal disilicides C11 b C40 structures, which closely related .
elsevier.com
sci-hub.se 参考文章(22)
H. Inui, M. Moriwaki, S. Ando, M. Yamaguchi, Plastic deformation of single crystals of CrSi2 with the C40 structure Materials Science and Engineering A-structural Materials Properties Microstructure and Processing. pp. 63- 68 ,(1997) , 10.1016/S0921-5093(97)00561-3
Y Umakoshi, T Nakano, E Yanagisawa, T Takezoe, A Negishi, None, Effect of alloying elements on anomalous strengthening of NbSi2-based silicides with C40 structure Materials Science and Engineering A-structural Materials Properties Microstructure and Processing. pp. 102- 108 ,(1997) , 10.1016/S0921-5093(97)00566-2
K. Ito, H. Inui, Y. Shirai, M. Yamaguchi, Plastic deformation of MoSi2 single crystals Philosophical Magazine. ,vol. 72, pp. 1075- 1097 ,(1995) , 10.1080/01418619508239954
S.A. Maloy, T.E. Mitchell, A.H. Heuer, High temperature plastic anisotropy in MoSi2 single crystals Acta Metallurgica Et Materialia. ,vol. 43, pp. 657- 668 ,(1995) , 10.1016/0956-7151(94)00260-O
H. Inui, M. Moriwaki, M. Yamaguchi, Plastic deformation of single crystals of VSi2 and TaSi2 with the C40 structure Intermetallics. ,vol. 6, pp. 723- 728 ,(1998) , 10.1016/S0966-9795(98)00045-4
Shyam P. Murarka, Silicide thin films and their applications in microelectronics Intermetallics. ,vol. 3, pp. 173- 186 ,(1995) , 10.1016/0966-9795(95)98929-3
M. Moriwaki, K. Ito, H. Inui, M. Yamaguchi, Plastic deformation of single crystals of NbSi2 with the C40 structure Materials Science and Engineering A-structural Materials Properties Microstructure and Processing. ,vol. 239, pp. 69- 74 ,(1997) , 10.1016/S0921-5093(97)00562-5
D.M. Shah, D. Berczik, D.L. Anton, R. Hecht, Appraisal of other silicides as structural materials Materials Science and Engineering A-structural Materials Properties Microstructure and Processing. ,vol. 155, pp. 45- 57 ,(1992) , 10.1016/0921-5093(92)90311-N
Q.Z. Hong, Stella Q. Hong, F.M. D'Heurle, J.M.E. Harper, Thermal stability of silicide on polycrystalline Si Thin Solid Films. ,vol. 253, pp. 479- 484 ,(1994) , 10.1016/0040-6090(94)90370-0
K. Tanaka, K. Nawata, H. Inui, M. Yamaguchi, M. Koiwa, Refinement of crystallographic parameters in transition metal disilicides with the C11b, C40 and C54 structures Intermetallics. ,vol. 9, pp. 603- 607 ,(2001) , 10.1016/S0966-9795(01)00048-6