作者: Masayoshi Tsuji
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摘要: In an avalanche photodiode having a separated electron injection type light absorbing layer/multiplication layer structure, the multiplication comprises (1−x−y) Al x Ga y As with composition thereof being graded from InAlAs on side to InGaAs and preferably has thickness of not more than 0.1 μm. By virtue above construction, very low noise characteristics ultraspeed can be attained in photodetectors at 1 μm wavelength for long distance optional communications.