E-beam application to mask making using new improved KRS resist system
作者： Karen E. Petrillo , Ahmad D. Katnani , Wayne M. Moreau , James J. Bucchignano , Wu-Song Huang
DOI:
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摘要: The present invention relates to chemically amplified resists and resist systems wherein some of the polar functional groups aqueous base soluble polymer or copolymers are protected with a cyclic aliphatic ketal protecting group such as methoxycyclohexanyl. containing new have improved shelf-life vacuum stability compared prior art resists. Thus, highly useful in e-beam lithographic applications.
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