UV light sources with microwave excited molecular gas plasmas

摘要: Molecular gas discharge plasma has long kept a higher potential to use as ultraviolet light source. The value of it should be rising replace the common UV lightning using by toxic mercury. Our 3-years-work this JST project been founded following candidates, i.e., carbon monoxide (CO), nitrogen oxide (N2O2), water vapor (H2O), and its with rare gases. First, CO many vacuum peaks from A1Pi X1Sigma+ in wide range 150-210 nm. Among peaks, we can choose enhance few peaks. For example, peak 156 nm was enlarged twice compare maximum pure at 173 Second, nitric (NO) have optimized through oxygen contents (10-20%). are emitted NO within germicidal effect (210-315 nm). Finally, microwave 310 OH radicals. It shows most intense concentrated emission saturated pressure RT. We report previous suggested gases but they small parts possible molecular