Extreme ultraviolet light source apparatus, method for controlling extreme ultraviolet light source apparatus, and recording medium with program recorded thereon
作者： Masato Moriya , Tooru Abe , Hideyuki Hayashi
DOI:
关键词:
摘要: An extreme ultraviolet light source apparatus, in which a target material is irradiated with laser beam from apparatus and the turned into plasma, thereby emitting light, may include burst control unit configured to irradiation of outputted successively pulses when emitted pulses. The prevented being plasma by while successive pulsed emission paused.
lens.org 参考文章(47)
James M. Forsyth, X-ray lithography system ,(1984)
Michael B. Petach, Steven W. Fornaca, Rocco A. Orsini, Target steering system for EUV droplet generators ,(2002)
Jr. Thomas E. Drake, Marc Dubois, Kenneth R. Yawn, Pre-amplifier for detection lasers within laser ultrasonic inspection systems ,(2007)
Guido Hergenhan, Diethard Kloepfel, Arrangement and method for metering target material for the generation of short-wavelength electromagnetic radiation ,(2005)
H Musebeck, H Diepers, Method of producing a composite conductor band for use in making a tubular superconductor ,(1972)
Guido Giusti, Johann Walker, Device for determining projectile velocity, especially at the muzzle of a gun barrel ,(2004)
Frank Melzer, Martin Antoni, Andreas Seifert, Wolfgang Singer, Focusing-device for the radiation from a light source ,(2003)
Masaki Nakano, Extreme ultra violet light source device ,(2006)
Hideo Hoshino, Akira Endo, Debris collector for euv light generator ,(2004)
Mark E. Michaelian, Armando Martos, Jeffrey S. Hartlove, Henry Shields, Samuel Talmadge, Steven W. Fornaca, Laser-produced plasma EUV light source with pre-pulse enhancement ,(2003)