Effect of oxygen partial pressure on the structural and optical properties of ZnO film deposited by reactive sputtering
作者： JP Zhang , G He , LQ Zhu , M Liu , SS Pan
DOI: 10.1016/J.APSUSC.2007.06.005
关键词:
摘要: Effects of variation the oxygen partial pressure on structural and optical properties zinc oxide (ZnO) thin films prepared by reactive radio-frequency sputtering were investigated. Measurements X-ray diffraction (XRD) atomic force microscopy (AFM) indicated that crystallinity surface morphology sensitive to pressure. The interfacial targeted investigated spectroscopic ellipsometry (SE) characterization. Based Tauc-Lorentz (TL) model, constants ZnO tentatively extracted in photon energy ranging from 1.5 6.0 eV. Analyses XRD SE revealed had effect orientation films, morphology, packing density, layers. And relationship between layer, as well roughness density was discussed. All these a significant impact illustrated analysis.
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