Area-Selective Atomic Layer Deposition of Platinum on YSZ Substrates Using Microcontact Printed SAMs
作者： Xirong Jiang , Stacey F. Bent
DOI: 10.1149/1.2789301
关键词:
摘要: Using (methylcyclopentadienyl)trimethylplatinum (MeCpPtMe 3 ) and oxygen as precursors, Pt has been deposited by atomic layer deposition (ALD) on the surfaces of yttria-stabilized zirconia (YSZ), a solid oxide electrolyte, well oxide-covered silicon. Ex situ analyses have carried out to examine properties both as-deposited postannealed films. X-ray photoelectron spectroscopy measurements demonstrate that there are no detectable impurities in films, four-point probe show resistivity for 30.2 nm film is low 18.3 μΩ cm. The use area-selective ALD deposit patterned also investigated. By coating these same substrates with octadecyltrichlorosilane (ODTS) self-assembled monolayers (SAMs), can be successfully blocked. Furthermore, it shown transferring ODTS SAMs microcontact printing (μCP) using stamps, platinum thin films grown selectively SAM-free surface regions. Features sizes small 2 μm this combined ALD-μCP method; resolution limited printed pattern and, likely, achieved at dimensions significantly smaller than micrometer.
ecsdl.org参考文章(42)
Myung M. Sung, G. Jonathan Kluth, Roya Maboudian, Formation of alkylsiloxane self-assembled monolayers on Si3N4 Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 17, pp. 540- 544 ,(1999) , 10.1116/1.581616
Julio Gun, Jacob Sagiv, On the formation and structure of self-assembling monolayers Journal of Colloid and Interface Science. ,vol. 112, pp. 457- 472 ,(1986) , 10.1016/0021-9797(86)90114-1
Joanna Aizenberg, Andrew J. Black, George M. Whitesides, Controlling local disorder in self-assembled monolayers by patterning the topography of their metallic supports Nature. ,vol. 394, pp. 868- 871 ,(1998) , 10.1038/29730
David L. Allara, Ralph G. Nuzzo, Spontaneously organized molecular assemblies. 1. Formation, dynamics, and physical properties of n-alkanoic acids adsorbed from solution on an oxidized aluminum surface Langmuir. ,vol. 1, pp. 45- 52 ,(1985) , 10.1021/LA00061A007
Andrew J. Black, Kateri E. Paul, Joanna Aizenberg, George M. Whitesides, Patterning Disorder in Monolayer Resists for the Fabrication of Sub-100-nm Structures in Silver, Gold, Silicon, and Aluminum Journal of the American Chemical Society. ,vol. 121, pp. 8356- 8365 ,(1999) , 10.1021/JA990858S
G.Kane Jennings, Paul E. Laibinis, Self-assembled monolayers of alkanethiols on copper provide corrosion resistance in aqueous environments Colloids and Surfaces A: Physicochemical and Engineering Aspects. ,vol. 116, pp. 105- 114 ,(1996) , 10.1016/0927-7757(96)03626-6
R.L. Puurunen, Growth Per Cycle in Atomic Layer Deposition: Real Application Examplesof a Theoretical Model Chemical Vapor Deposition. ,vol. 9, pp. 327- 332 ,(2003) , 10.1002/CVDE.200306266
C. P. Tripp, R. P. N. Veregin, M. L. Hair, Effect of fluoroalkyl substituents on the reaction of alkylchlorosilanes with silica surfaces Langmuir. ,vol. 9, pp. 3518- 3522 ,(1993) , 10.1021/LA00036A029
W.Robert Ashurst, C Carraro, R Maboudian, W Frey, Wafer level anti-stiction coatings for MEMS Sensors and Actuators A-physical. ,vol. 104, pp. 213- 221 ,(2003) , 10.1016/S0924-4247(03)00023-2
B. C. Bunker, R. W. Carpick, R. A. Assink, M. L. Thomas, M. G. Hankins, J. A. Voigt, D. Sipola, M. P. de Boer, G. L. Gulley, The impact of solution agglomeration on the deposition of self-assembled monolayers Langmuir. ,vol. 16, pp. 7742- 7751 ,(2000) , 10.1021/LA000502Q