Inelastic scattering techniques for in situ characterization of thin film growth: backscatter Kikuchi diffraction
作者： N.J.C. Ingle
DOI: 10.1533/9780857094957.1.29
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摘要: Abstract: The inherent characteristics of electron diffraction are particularly useful for determining the full structure (lattice parameters, space group, atomic positions) thin films in situ and real-time. Electrons easy to generate, manipulate, detect, they have a strong interaction with matter. However, dynamic nature generally makes detailed analysis complicated. Along multiple scattering complications comes one significant benefit: formation Kikuchi patterns. These contain within them representation three-dimensional probed material.
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