Method for decomposition of a customized DOE for use with a single exposure into a set of multiple exposures using standard DOEs with optimized exposure settings

作者: Ting Chen , Jang Fung Chen

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摘要: A method of determining diffractive optical elements to be utilized in an imaging process. The includes the steps defining a customized element which is based on target pattern printed during process; decomposing into one or more standard elements; and exposure dose assigned each elements.

参考文章(9)
Robert John Socha, ジョン ソチャ ロバート, Source and mask optimization ,(2004)
Donis Flagello, Robert Socha, Steven G. Hansen, Optimized polarization illumination ,(2004)
Gerjan Peter Veldhuis, Der Schoot Harmen Klaas Van, Erik Roelof Loopstra, Gerrit Maarten Bonnema, Beek Paulus Martinus Henricus Ter, Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device ,(1997)
Shoji Mimotogi, Takahiro Ikeda, Soichi Inoue, Takashi Sato, Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device ,(2005)