Source gas delivery
作者： Woo Sik Yoo
DOI:
关键词:
摘要: A method and system are provided for delivering a source gas to processing chamber. delivery includes providing precursor chamber configured hold vapor, saturated vapor at selected pressure within the chamber, flowing or diffusing from until is in heat heating liquid provide pathway allowing enter Advantageously, present invention allows improved enhanced control over thin film deposition with less waste of material.
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