Angular ion and neutral energy distribution in a collisional rf sheath

作者: A. Manenschijn , W. J. Goedheer

DOI: 10.1063/1.348602

关键词:

摘要: A numerical study on the ion and neutral angular impact energy distribution at rf‐driven electrode of a reactive etcher is presented. The calculations for ions are performed using Monte Carlo method that includes charge exchange elastic scattering. contribution both collision processes to studied. For case only process, results can be checked against those based spatially uniform time independent rate. In case, methods yield same distribution. position, velocity, propagation angle energetic neutrals created in collisions with background gas stored. These used as input data separate code follows evolution distribution, taking into account (multiple) From distributions, number ...

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