X-ray Reflectivity Characterisation of Thin-Film and Multilayer Structures
作者： P. Zaumseil
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摘要: X-ray reflectivity is a very sensitive method to investigate thin-film and multilayer structures. The main parameters obtained are thickness, roughness, layer density. Concerning the thickness range of application, it well suited for many materials used in modern information technologies. It non-destructive technique, but due low incidence angles radiation requires relatively large sample areas. Nevertheless, indispensable evaluation monitoring future thin film deposition techniques.
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