Molecular dynamics simulations of surface smoothing and sputtering process with glancing-angle gas cluster ion beams

作者: Takaaki Aoki , Jiro Matsuo

DOI: 10.1016/J.NIMB.2007.01.048

关键词:

摘要: Abstract Surface modification processes with glancing-angle large gas cluster irradiation were studied by molecular dynamics simulations. The MD simulation of an Ar 2000 impacting on Si(1 0 0) substrate small Si 4096 block structure attached the surface was performed. result has shown that, when impacts target at 20 keV total acceleration energy and 80° incident angle, slides without creating damage most constituent atoms in collide sidewall block. Up to 10 keV kinetic transferred irregular structure, which results sputtering or stretching is smoothed. This characteristic effect observed located farther than 200 A from point where contacts surface.

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