作者: Min Song , Chenglong Zhang , Hai Wu , Jichun Mu , Zhuobiao Ma
DOI: 10.1016/J.ATMOSENV.2018.08.014
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摘要: Abstract The formation of secondary organic aerosol (SOA) from isoprene ozonolysis was investigated using a FEP Teflon reactor with and without the presence H2O, CO, SO2 UV-light irradiation (365 nm) to reveal their possible influence on SOA formation. Compared base experiment (isoprene + O3) under dark condition, 2000 ppm H2O 1000 ppm CO could remarkably suppress ozonolysis, yields reduced 2.96% 1.47% 2.08%, respectively. evident reduction mainly ascribed suppression Stable Criegee Intermediates (SCIs). In contrast, particle yield pronouncedly increased 57.9%, suggesting that oxidation by SCIs made great contribution or all reaction systems more than 27% respect which were attributed photolysis. OH channel estimated be less 30%. Considering 50% light irradiation, disappearance component low O:C H:C high molecule weight in sample collected indicated polymerization unsaturated might an important besides oligomerization SCIs, HCHO, MACR condition.