作者: Yasir Hussein Mohammed , Samsudi Bin Sakrani , Md Supar Rohani
DOI: 10.1016/J.SPMI.2015.07.021
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摘要: Abstract Nanometer sized silicon (Si) needles (nanowires) offer a vehicle for varieties of applications at nanoscale. We grow Si nanoneedles (SiNNs) using very high frequency plasma enhanced chemical vapor deposition (VHF-PECVD) method with distinct gold (Au) nanostructures (NSs) as catalyst. Au NSs in the form nanoparticles (NPs) and continuous thin film are prepared on Si(1 0 0) substrates via radio magnetron sputtering. catalyst size dependent surface morphology structural features these SiNNs determined. Samples characterized imaging spectroscopic measurements. Controlled growth such structure reproducibility that is achieved NPs tunability attributed to vapor–liquid–solid (VLS) mechanism. diameters between 20 120 nm length up 5 μm acquired. diameter found increase size. Processing parameters optimization demonstrated play critical role nucleating thereby achieving density morphology. X-ray diffraction patterns authenticated an crystallinity increasing Raman spectra revealed red-shift (∼8.26 cm−1) first-order transversal band average NNs decrease from 69 57 nm. Our systematic synthesis characterization may contribute toward development based optoelectronics.