The retention mechanism in poly(ethylene glycol) 20M layer on the surface of a silanized support
作者： K. Surowiec , J. Rayss
DOI: 10.1007/BF02269736
关键词:
摘要: The properties of poly(ethylene glycol) 20M (PEG 20M) on the silanized surface Chromosorb W HMDS were investigated. It was found that layer PEG is in a liquid form below its melting temperature. stationary phase loading ratio above 0.105 main retention mechanism partition both and solid forms 20M. contribution adsorption to volume also determined. suggested case methanol this caused by residual silanol groups present support whereas for n-octane rather gas-liquid interface.
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