Weakly absorbing layers: interferometric determination of their optical parameters

作者: Y. Demner , J. Shamir

DOI: 10.1364/AO.17.003738

关键词:

摘要: The determination of the absorption very weakly absorbing thin films and film systems is a difficult problem. In present work previously suggested method generalized improved in order to apply it for multilayers. case single layers, measurement adequate determine also thickness refractive index film. main advantages described here are its simplicity, self-calibrating nature, high sensitivity absorption.

参考文章(8)
K. Kinosita, M. Yamamoto, Recent developments in ellipsometry that are useful for thin film studies Thin Solid Films. ,vol. 34, pp. 283- 290 ,(1976) , 10.1016/0040-6090(76)90477-6
J. Shamir, On the alignment of laser systems American Journal of Physics. ,vol. 45, pp. 1118- 1119 ,(1977) , 10.1119/1.10972
R. A. Hoffman, Apparatus for the measurement of optical absorptivity in laser mirrors. Applied Optics. ,vol. 13, pp. 1405- 1411 ,(1974) , 10.1364/AO.13.001405
H. Ahrens, H. Welling, H. E. Scheel, Measurement of optical absorption in dielectric reflectors Applied physics. ,vol. 1, pp. 69- 71 ,(1973) , 10.1007/BF00886806
J. Shamir, R. Fox, Classroom Demonstration of Interference Phenomena Using a He-Ne Gas Laser American Journal of Physics. ,vol. 35, pp. 161- 162 ,(1967) , 10.1119/1.1973930